Products Semiconductor Optics
Lithography Process Foundry
Lithography Process Foundry
Lithography Process Foundry
Feature
MOE can provide a complete set of professional lithography process, including spin-coating, exposure, develop, and photoresist strip . The applicable range of wafer size is 6" 8" 12"
1. 6", 8", 12" Semiconductor optical foundry
2. 8", 12" Photoresist, etching foundry
 

 

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