Color Filter
Morrison Optoelectronics provides suitable spectra in different image structures according to
customer needs. R, G, B, combined image structures are available separately.
Professional
Semiconductor Optics
Morrison Optoelectronics integrates semiconductor lithography process and precision optical coating design, which integrate different optical bands required by customers into one chip. The light bands that could be designed include ultraviolet, visible light, near-infrared light, and far-infrared light. The optical coating method could adopt vapor deposition or sputtering physical vapor deposition to form multi-layer thin films, according to the customer's process requirements. Morrison Optoelectronics manufactures patterned optical coatings with semiconductor processes, which has comparative advantages in process accuracy and quality control.Process capability: Wafer coating sizes include 6 inches, 8 inches, and 12 inches.
Precision Optics
In addition to the original general traditional optical coating, Morrison Optoelectronics has three main forces in precision optics:
- 1. Absorptive material applied to RGBIR sensor
- 2. Patterned filters
- 3. DGF (Digital Gradient Filter)
Optical Microlens
In order to improve light-gathering efficiency, Morrison Optoelectronics uses reflow micro-lens technology to produce pixel designs as small as 3 microns and as large as 50 microns.
Lithography Process Foundry
Morrison Optoelectronics’lithography process can be used for optical film and wafer semiconductor optical foundry in the optoelectronic industry:
- 1. 6", 8", 12" Semiconductor optical foundry
- 2. 8", 12" Photoresist, etching foundry
- 3. Glass Microstructure
