黃光製程 半導體光學
黃光製程
黃光製程
黃光製程
特色
MOE can provide a complete set of professional lithography process, including spin-coating, exposure, develop, and photoresist strip . The applicable range of wafer size is 6" 8" 12"
1. 6", 8", 12" Semiconductor optical foundry
2. 8", 12" Photoresist, etching foundry
 

 

We use cookies to provide the services and features offered on our website, and to improve our user experience. By using this website, you consent to the use of cookies.

OK